【6/21/2021 】CAPA-NoVA Distinguished Chinese American Project
（Author: Yuyan Zhou)
Robert S. Chau （1960- ）is an Intel Fellow and Director of Transistor Research. He is responsible for directing research and development in advanced transistors and gate dielectrics for microprocessor applications. He is also responsible for leading research efforts in advanced nanotechnology for future device and process applications.
Dr. Chau joined Intel in 1989 and developed seven generations of Intel gate oxides along with many transistor innovations used in various Intel logic products. He also introduced many new process modules and electrical test capability for Intel’s future logic processes. Dr. Chau was promoted in 2000 to the rank of Intel Fellow, the company’s highest and most prestigious technical position.
Dr. Chau manages the Novel Device Laboratory and leads a research team focusing on new transistor architectures, process modules and technologies, and characterization techniques for the 45nm and 30nm logic technology nodes and beyond. He is also the high-K program manager responsible for the research and development of alternative gate dielectric stacks.
Dr. Chau received his bachelor’s and master’s degrees and Ph.D. in electrical engineering from The Ohio State University. He holds 37 United States patents in device and process technologies, and has received five Intel Achievement Awards and 13 Intel Logic Technology Development Division Recognition Awards for his outstanding technical achievements in gate oxide, transistor and process module research and development.
An IEEE Fellow, Dr. Chau is also a co-recepient of the 2012 IEEE Jun-ichi Nishizawa Medal, awarded annually to those who have made “outstanding contributions to material and device science and technology, including practical application.” Dr. Chau received this award, along with Bohr and Ghani, for “sustained leadership in developing innovative transistor technologies for advanced logic products.” Dr. Chau is currently an Intel Senior Fellow and director of transistor research and nanotechnology at Intel Corp., Hillsboro, Ore., where he has worked since 1989
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